Search

Semiconductor Integration Materials LaboratorySIM Lab

Semiconductor Integration Materials LaboratorySIM Lab

News
Research
People
Publications
Contact

Woon Ih Choi

Latest

Gate structuring on bilayer MoS2 nFET enables ultrahigh current density

© 2026 SIM Lab, Hanyang University.

Published with Hugo Blox Builder — the free, open source website builder that empowers creators.

Cite