Semiconductor Integration Materials Laboratory
SIM Lab
Semiconductor Integration Materials Laboratory
SIM Lab
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Fluorinated Graphene Contacts and Passivation Layer for MoS2 Field-effect Transistors
Tailoring Surface Properties via Functionalized Hydrofluorinated Graphene Compounds
Atomically-precise Graphene Etch Stops for 3D Integrated Systems from 2D Material Heterostructures
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