Min Seok Yoo | SIM Lab @ Hanyanghttps://simlab-hanyang.netlify.app/author/min-seok-yoo/Min Seok YooHugo Blox Builder (https://hugoblox.com)en-usMon, 19 Jan 2026 00:00:00 +0000https://simlab-hanyang.netlify.app/media/icon_hu1894465713090127486.pngMin Seok Yoohttps://simlab-hanyang.netlify.app/author/min-seok-yoo/Gate structuring on bilayer MoS2 nFET enables ultrahigh current densityhttps://simlab-hanyang.netlify.app/publication/2026-gate-structuring-bilayer-mos2/Mon, 19 Jan 2026 00:00:00 +0000https://simlab-hanyang.netlify.app/publication/2026-gate-structuring-bilayer-mos2/EOT-scaled 2D FETs on embedded bottom gates using direct channel growth on 200 mm wafershttps://simlab-hanyang.netlify.app/publication/2025-eot-scaled-2d-fets-iedm/Mon, 08 Dec 2025 00:00:00 +0000https://simlab-hanyang.netlify.app/publication/2025-eot-scaled-2d-fets-iedm/200-mm-wafer-scale integration of polycrystalline molybdenum disulfide transistorshttps://simlab-hanyang.netlify.app/publication/2024-wafer-scale-mos2-nature-electronics/Wed, 24 Apr 2024 00:00:00 +0000https://simlab-hanyang.netlify.app/publication/2024-wafer-scale-mos2-nature-electronics/Ultraclean Interface of Metal Chalcogenides with Metal through Confined Interfacial Chalcogenizationhttps://simlab-hanyang.netlify.app/publication/2024-ultraclean-interface-metal-chalcogenides/Fri, 12 Jan 2024 00:00:00 +0000https://simlab-hanyang.netlify.app/publication/2024-ultraclean-interface-metal-chalcogenides/Wafer-scale integration of transition metal dichalcogenide field-effect transistors using adhesion lithographyhttps://simlab-hanyang.netlify.app/publication/2023-wafer-scale-tmd-adhesion-lithography/Wed, 01 Feb 2023 00:00:00 +0000https://simlab-hanyang.netlify.app/publication/2023-wafer-scale-tmd-adhesion-lithography/