Semiconductor Integration Materials Laboratory
SIM Lab
Semiconductor Integration Materials Laboratory
SIM Lab
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Kyung-Eun Byun*
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Gate structuring on bilayer MoS2 nFET enables ultrahigh current density
Transfer-free 2D CMOS multi-bridge-channel FET
200-mm-wafer-scale integration of polycrystalline molybdenum disulfide transistors
Low-temperature growth of nanocrystalline graphene on metal thin films
Amorphous Carbon Films for Electronic Applications
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