Semiconductor Integration Materials Laboratory
SIM Lab
Semiconductor Integration Materials Laboratory
SIM Lab
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Junyoung Kwon†
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Gate structuring on bilayer MoS2 nFET enables ultrahigh current density
Growth-based monolithic 3D integration of single-crystal 2D semiconductors
The future of two-dimensional semiconductors beyond Moore's law
200-mm-wafer-scale integration of polycrystalline molybdenum disulfide transistors
Atomically-precise Graphene Etch Stops for 3D Integrated Systems from 2D Material Heterostructures
Thickness-Dependent Schottky Barrier Height of MoS2 Field-Effect Transistors
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