Kwon Group at Hanyang University

Semiconductor Integration
Materials Laboratory

Materials innovation for next-generation semiconductor integration — from novel 2D materials to monolithic 3D architectures.

Research Pillar 01

Future Logic
Devices

Wafer-scale 2D GAAFETs and monolithically stacked CFETs, pushing logic scaling beyond the limits of silicon.

Research Pillar 02

Future Memory
Devices

Ferroelectric FeFETs and oxide memory cells, grown directly on top of logic for dense, low-power storage.

Research Pillar 03

Low-Temperature
Growth

Single-crystal 2D materials grown below 400°C — the enabling technology behind monolithic integration.

Selected Publications